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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE blazed gratings: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
*60 nm Barc
<gallery>
*360 nm KRF resist
 
Image:IBE 30min -Cr1.jpg
Image:after IBE 45min_A_34.jpg
Image:Edge_1.jpg
Image:15min+30min5.jpg


''by bghe@nanolab'' experiments made in June/July 2012
<gallery widths="300px" heights="250px" caption="Some examples of blazed gratings in fused silica etched with Cr and DUV resist as masking layer">
Image:IBE 30min -Cr1.jpg |'''30 min etch with 100 nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 400 mA<br>*RF power = 1300 W<br>*I(B) = 300 mA<br>*V(B) = 300 V<br>*V(AC,B)=500 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 5 sccm<br>*CHF3 flow = 15 sccm
Image:after IBE 45min_A_34.jpg |'''45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 400 mA<br>*RF power = 1300 W<br>*I(B) = 300 mA<br>*V(B) = 300 V<br>*V(AC,B) = 500 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 5 sccm<br>*CHF3 flow = 15 sccm
Image:Edge_1.jpg|'''20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 550 mA<br>*RF power = 1300 W<br>*I(B) = 500 mA<br>*V(B) = 600 V<br>*V(AC,B) = 400 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 10 sccm<br>*CHF3 flow = 0 sccm
Image:15min+30min5.jpg|'''15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 400 mA<br>*RF power = 1300 W<br>*I(B) = 300 mA<br>*V(B) = 300 V<br>*V(AC,B) = 500 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 5 sccm<br>*CHF3 flow = 15 sccm
</gallery>
</gallery>

Latest revision as of 11:25, 4 September 2025

Feedback to this page: click here
The content on this page, including all images and pictures, was created by Berit Herstrøm @ DTU Nanolab (BGHE), unless otherwise stated.

  • 60 nm Barc
  • 360 nm KRF resist

by bghe@nanolab experiments made in June/July 2012

  • Some examples of blazed gratings in fused silica etched with Cr and DUV resist as masking layer
  • 30 min etch with 100 nm Cr mask, used recipe BGHE blazed gratings with CHF3 *Rotation speed 0 rpm *Angle: -35 *I(N) = 400 mA *RF power = 1300 W *I(B) = 300 mA *V(B) = 300 V *V(AC,B)=500 V *Ar(N) flow = 5 sccm *Ar(B) flow = 5 sccm *CHF3 flow = 15 sccm
    30 min etch with 100 nm Cr mask, used recipe BGHE blazed gratings with CHF3
    *Rotation speed 0 rpm
    *Angle: -35
    *I(N) = 400 mA
    *RF power = 1300 W
    *I(B) = 300 mA
    *V(B) = 300 V
    *V(AC,B)=500 V
    *Ar(N) flow = 5 sccm
    *Ar(B) flow = 5 sccm
    *CHF3 flow = 15 sccm
  • 45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3 *Rotation speed 0 rpm *Angle: -35 *I(N) = 400 mA *RF power = 1300 W *I(B) = 300 mA *V(B) = 300 V *V(AC,B) = 500 V *Ar(N) flow = 5 sccm *Ar(B) flow = 5 sccm *CHF3 flow = 15 sccm
    45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
    *Rotation speed 0 rpm
    *Angle: -35
    *I(N) = 400 mA
    *RF power = 1300 W
    *I(B) = 300 mA
    *V(B) = 300 V
    *V(AC,B) = 500 V
    *Ar(N) flow = 5 sccm
    *Ar(B) flow = 5 sccm
    *CHF3 flow = 15 sccm
  • 20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings *Rotation speed 0 rpm *Angle: -35 *I(N) = 550 mA *RF power = 1300 W *I(B) = 500 mA *V(B) = 600 V *V(AC,B) = 400 V *Ar(N) flow = 5 sccm *Ar(B) flow = 10 sccm *CHF3 flow = 0 sccm
    20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings
    *Rotation speed 0 rpm
    *Angle: -35
    *I(N) = 550 mA
    *RF power = 1300 W
    *I(B) = 500 mA
    *V(B) = 600 V
    *V(AC,B) = 400 V
    *Ar(N) flow = 5 sccm
    *Ar(B) flow = 10 sccm
    *CHF3 flow = 0 sccm
  • 15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3 *Rotation speed 0 rpm *Angle: -35 *I(N) = 400 mA *RF power = 1300 W *I(B) = 300 mA *V(B) = 300 V *V(AC,B) = 500 V *Ar(N) flow = 5 sccm *Ar(B) flow = 5 sccm *CHF3 flow = 15 sccm
    15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3
    *Rotation speed 0 rpm
    *Angle: -35
    *I(N) = 400 mA
    *RF power = 1300 W
    *I(B) = 300 mA
    *V(B) = 300 V
    *V(AC,B) = 500 V
    *Ar(N) flow = 5 sccm
    *Ar(B) flow = 5 sccm
    *CHF3 flow = 15 sccm
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