Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/SIMS settings: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/SIMS_settings click here]'''
<br> {{CC-bghe1}} - ''2015''<br>
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Latest revision as of 15:50, 6 February 2023

Feedback to this page: click here


This page is written by Berit Herstrøm @ DTU Nanolab (BGHE) if nothing else is stated - 2015

SIMS setting for different materials
  Lower plate Upper plate
Ti -1
Si -1 (2)
Al -1 1
Cr -1
Ni -6
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