Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-3: Difference between revisions
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<!--Checked for updates on 11/2-2019 - ok/jmli --> | |||
<!-- Page reviewed 9/8-2022 jmli --> | |||
<!--Page reviewed by jmli 28/4-2023 --> | |||
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| 10 minute TDESC clean | | 10 minute TDESC clean | ||
| | | nanolab/jml/showerhead/prD/PrD-3, 150 cyc or 8:48 mins | ||
| S004781 | | S004781 | ||
! New showerhead | ! New showerhead | ||
Latest revision as of 11:28, 28 April 2023
Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 8/1-2015 | 4" Wafer with travkaXX mask | AZ standard | Si / XX % | Pegasus/jmli | 10 minute TDESC clean | nanolab/jml/showerhead/prD/PrD-3, 150 cyc or 8:48 mins | S004781 | New showerhead |
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