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Specific Process Knowledge/Characterization/SIMS: Secondary Ion Mass Spectrometry: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SIMS:_Secondary_Ion_Mass_Spectrometry click here]'''
'''<p style="color:red;">The Atomika SIMS has been decomissioned and is no longer available.</p>'''
==Atomika SIMS==
==Atomika SIMS==
[[Image:Equipment_SIMS.jpg|300x300px|thumb|Atomika SIMS: positioned in the basement of building 346 (underneath the cleanroom).]]
 
The SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined..

Latest revision as of 15:07, 2 June 2025

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The Atomika SIMS has been decomissioned and is no longer available.

Atomika SIMS

The SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined..