Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original: Difference between revisions

From LabAdviser
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..."
 
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
 
(7 intermediate revisions by the same user not shown)
Line 1: Line 1:
<!--Checked for updates on 11/2-2019 - ok/jmli -->
<!--Page reviewed by jmli 9/8-2022  -->
<!--Page reviewed by jmli 28/4-2023  -->
{{Author-jmli1}}


{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
Line 18: Line 22:
|-
|-
| 20/11-2014
| 20/11-2014
| 6" Wafer with 210 nm oxide and 1800 nm polysilicon
| 4" Wafer with AZ resist
| standard stepper mask (50 nm barc + 320 nm krf)
| Travka50 pattern
| Si / 50+ %  
| Si / 50+ %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean
| danchip/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| nanolab/jml/showerhead/prD, 110 cycles or 8:04 minutes  
| S004675
| S004584
! Old showerhead  
! Old showerhead  
|  
|  
[[file:S00459305.jpg|150px|frameless ]]
[[file:S004584-1.jpg|150px|frameless]]
[[file:S00459306.jpg|150px|frameless ]]
[[file:S004584-3.jpg|150px|frameless]]
[[file:S00459307.jpg|150px|frameless ]]
 
[[file:S00459308.jpg|150px|frameless ]]
[[file:s004593-01.jpg|150px|frameless ]]
[[file:s004593-02.jpg|150px|frameless ]]
[[file:s004593-03.jpg|150px|frameless ]]
|-
|-
| 1/12-2014
| 1/12-2014
Line 41: Line 41:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| nanolab/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| S004675
| S004675
! New showerhead  
! New showerhead  

Latest revision as of 11:27, 28 April 2023

Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab

Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
20/11-2014 4" Wafer with AZ resist Travka50 pattern Si / 50+ % Pegasus/jmli 10 minute TDESC clean nanolab/jml/showerhead/prD, 110 cycles or 8:04 minutes S004584 Old showerhead

1/12-2014 1/4 6" Wafer with 210 nm oxide and 1800 nm polysilicon crystalbonded on carrier standard stepper mask (50 nm barc + 320 nm krf) Si / 50+ % Pegasus/jmli 10 minute TDESC clean + 45 sec barc etch nanolab/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes S004675 New showerhead
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original&oldid=45949"