Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/SIMS settings: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/SIMS_settings click here]''' | |||
<br> {{CC-bghe1}} - ''2015''<br> | |||
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Latest revision as of 15:50, 6 February 2023
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This page is written by Berit Herstrøm @ DTU Nanolab (BGHE) if nothing else is stated - 2015
| SIMS setting for different materials | ||
| Lower plate | Upper plate | |
|---|---|---|
| Ti | -1 | |
| Si | -1 | (2) |
| Al | -1 | 1 |
| Cr | -1 | |
| Ni | -6 | |