These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.
== Process Flow ==
Test of ZEP resist; a positive e-beam resist from ZEON.
1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.
This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
Use CSAR instead.
2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.
Contact lithography@nanolab.dtu.dk if you wish to use this resist.
== Spin Curves ==
== Spin Curves ==
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!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old.
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
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!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
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!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
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Latest revision as of 20:34, 25 November 2019
This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
Use CSAR instead.
Contact lithography@nanolab.dtu.dk if you wish to use this resist.
Spin Curves
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.
ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
Spin Speed [rpm]
Acceleration [1/s2]
Thickness [nm]
St Dev
3000
4000
111.29
0.65
4000
4000
95.17
2.16
5000
4000
87.23
0.81
ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
Spin Speed [rpm]
Acceleration [1/s2]
Thickness [nm]
St Dev
2000
4000
141.03
1.02
3000
4000
115.96
0.98
4000
4000
100.56
0.80
5000
4000
91.01
0.38
6000
4000
84.85
0.37
ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
