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Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions

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These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.




== Process Flow ==
This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
Test of Chemically Semi-Amplified Resist (CSAR); a positive e-beam resist from AllResist (AR-P 6200-2).
Use CSAR instead.


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
== Spin Curves ==
 
 
[[File:SpinCurveZEP520A.png|right|700px]]
 
 
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 40%"
|-
|-


|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!Equipment
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
!Process Parameters
!Comments
!Initials and date
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
|-style="background:silver; color:black" style="text-align:left;"  
!colspan="4"|Pretreatment
!Spin Speed [rpm]
!Acceleration [1/s2]
!Thickness [nm]
!St Dev
|-
|-


|-
|-style="background:WhiteSmoke; color:black"
|3000
|4000
|111.29
|0.65
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|4" Si wafers
|4000
|No Pretreatment
|4000
|
|95.17
|TIGRE, 08-04-2014
|2.16
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
|-style="background:WhiteSmoke; color:black"
!colspan="4"|Spin Coat
|5000
|4000
|87.23
|0.81
|-
|-




|-
|}
|-style="background:LightGrey; color:black"
 
|Spin Coater Manual, LabSpin, A-5
 
|AR-P 6200/2 AllResist E-beam resist
60 sec at various spin speed.
Acceleration 4000 s-2,
softbake 5 min at 150 deg Celcius
|Resist poured directly from bottle
|TIGRE, 09-04-2014
|-


|-
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 40%"
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Characterization
|-
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:red; color:White"
|Ellipsometer VASE B-1
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
|9 points measured on 100 mm wafer
|ZEP program used; measured at 70 deg only
|TIGRE, 09-04-2014
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
|-style="background:silver; color:black" style="text-align:left;"  
!colspan="4"|E-beam Exposure
!Spin Speed [rpm]
!Acceleration [1/s2]
!Thickness [nm]
!St Dev
|-
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|JEOL 9500 E-beam writer, E-1
|2000
|Dosepattern 14nm - 100nm,
|4000
dose 120-280 muC/cm2
|141.03
|Virtual chip mark height detection
|1.02
| TIGRE, 10-04-2014
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
|-style="background:WhiteSmoke; color:black"
!colspan="4"|Development
|3000
|4000
|115.96
|0.98
|-
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Fumehood, D-3
|4000
|60 sec in X AR 600-54/6,
|4000
60 sec rinse in IPA,
|100.56
N2 Blow dry
|0.80
|Agitation (by hand) while developing
| TIGRE, 10-04-2014
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
|-style="background:WhiteSmoke; color:black"
!colspan="4"|Characterization
|5000
|4000
|91.01
|0.38
|-
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
|Zeiss SEM Supra 60VP, D-3
|6000
|
|4000
|
|84.85
| TIGRE, ??-04-2014
|0.37
|-
|-


Line 107: Line 117:




== Spin Curve ==
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 40%"
 
 
[[File:SpinCurveCSAR.jpg|right|500px]]
 
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-


|-
|-
|-style="background:Black; color:White"
|-style="background:green; color:White"
!colspan="7"|AllResist AR-P 6200/2 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014
!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
|-
|-


|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black" style="text-align:left;"  
!Spin Speed [rpm]
!Spin Speed [rpm]
!Acceleration [1/s2]
!Acceleration [1/s2]
Line 134: Line 137:
|2000
|2000
|4000
|4000
|225.98
|79.12
|0.97
|1.74
|-
|-


Line 142: Line 145:
|3000
|3000
|4000
|4000
|194.00
|64.30
|0.6
|0.34
|-
|-


Line 150: Line 153:
|4000
|4000
|4000
|4000
|169.57
|55.50
|0.32
|0.48
|-
|-


Line 158: Line 161:
|5000
|5000
|4000
|4000
|151.47
|50.53
|0.26
|0.62
|-
|-


Line 166: Line 169:
|6000
|6000
|4000
|4000
|142.38
|46.34
|0.41
|1.01
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|7000
|4000
|126.59
|0.36
|-
|-


|}
|}

Latest revision as of 20:57, 25 August 2025


This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist. Use CSAR instead.

Spin Curves


The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.

ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
3000 4000 111.29 0.65
4000 4000 95.17 2.16
5000 4000 87.23 0.81


ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
2000 4000 141.03 1.02
3000 4000 115.96 0.98
4000 4000 100.56 0.80
5000 4000 91.01 0.38
6000 4000 84.85 0.37


ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
2000 4000 79.12 1.74
3000 4000 64.30 0.34
4000 4000 55.50 0.48
5000 4000 50.53 0.62
6000 4000 46.34 1.01
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