Specific Process Knowledge/Thermal Process/Furnace Noble: Difference between revisions

Latest revision as of 11:18, 2 February 2023

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EXPIRED!!! The Noble furnace has been removed from the cleanroom January 2020.

Noble furnace

The Noble Furnace is used for annealing and oxidation of different samples. Annealing can be done in a nitrogen or argon atmosphere. A bubbler has also been installed in the furnace, so it is possible to do both wet and dry oxidations. The maximum temperature of the furnace is 1000 ^oC.

In the Noble Furnaces more dirty samples with metals and some specific polymers are allowed. Different sample holder are available for wafers and smaller samples (placed on a Si carrier wafer).

The furnace is located in service area Cx1.

Please check the cross contamination information in LabManager before you use the furnace.

The user manual, technical information and contact information can be found in LabManager:

Noble furnace

Overview of the performance of the Noble Furnace

Purpose	Oxidation Annealing	Oxidation: Dry Wet (with bubbler. Water steam + N₂) Annealing: N₂ Ar
Process parameter range	Process Temperature	Up to 1000 ^oC
	Process pressure	1 atm
	Gasses on the system	N₂: 0-5 SLM O₂: 0-5 SLM Ar: 0-7 SLM
Substrates	Batch size	1-25 100 mm wafers (or 50 mm wafers) per run A number of smaller samples (placed on a Si carrier wafer)
Substrates	Substrate material allowed	Silicon samples Silicon samples with metals Silicon sample with polymers (only approved materials)

@@ Line 1: / Line 1: @@
 '''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_Noble click here]'''
+''This page is written by DTU Nanolab  internal''
+[[Category: Equipment |Thermal Noble]]
+[[Category: Thermal process|Noble]]
+[[Category: Furnaces|Noble]]
+===<span style="color:Red">EXPIRED!!! The Noble furnace has been removed from the cleanroom January 2020.</span>===
 ==Noble furnace==
-The Noble Furnace is mostly used for annealing and oxidation of different samples. Annealing can be done in a nitrogen or argon atmosphere. Autumn 2013 a bubler has also been installed in the furnace, so it is possible to do both wet and dry oxidations. The maximum temperature of the furnace is 1000 <sup>o</sup>C.
+The Noble Furnace is used for annealing and oxidation of different samples. Annealing can be done in a nitrogen or argon atmosphere. A bubbler has also been installed in the furnace, so it is possible to do both wet and dry oxidations. The maximum temperature of the furnace is 1000 <sup>o</sup>C.
 In the Noble Furnaces more dirty samples with metals and some specific polymers are allowed. Different sample holder are available for wafers and smaller samples (placed on a Si carrier wafer).
 The furnace is located in service area Cx1.
 Please check the cross contamination information in LabManager before you use the furnace.
-[[Image:Noble.JPG|thumb|300x300px|Noble furnace. Positioned in service area Cx1]]
+[[Image:Noble.JPG|thumb|300x300px|Noble furnace. Positioned in service area Cx1/ Photo: DTU Nanolab internal]]
 '''The user manual, technical information and contact information can be found in LabManager:'''
@@ Line 29: / Line 37: @@
 Oxidation:
 *Dry
-*Wet (with bubbler. water steam + N<sub>2</sub>)
+*Wet (with bubbler. Water steam + N<sub>2</sub>)
 Annealing:
 *N<sub>2</sub>
@@ Line 57: / Line 65: @@
 | style="background:LightGrey; color:black"|Substrate material allowed
 |style="background:WhiteSmoke; color:black"|
-*Silicon samples (new from the box or RCA cleaned)
+*Silicon samples
 *Silicon samples with metals
 *Silicon sample with polymers (only approved materials)
 |-
 |}