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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142 click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142 click here]'''
 
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== The nano1.42 recipe ==
== The nano1.42 recipe ==
{{Template:Author-jmli1}}
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==Etching SRN (Silicon Rich Nitride) with nano1.42==
''This test has been done by Leonid Beliaev'' <br>
*274nm SRN by LPCVD ("6 inch LS" recipe)
*Substrate: Si/SiO2(1100nm)
*DUV-lithography: KRF M230Y resist 360 nm, Barc 65 nm, exposure dose 220J/m2
*Pattern: Grating with period 400 nm and grating bar width of
*Barc etch in Pegasus 1 at -19 deg, 40s
*Nano 1.42 at -19 deg, 5 min
[[File:Etch_rate.png|400px]]
[[File:Test_007.jpg|400px|left|thumb|Image: Leonid Beliaev]]
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