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Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/RTP_Jipelec_2 click here]'''
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[[index.php?title=Category:Equipment|Thermal Jipelec]]
[[index.php?title=Category:Thermal process|Jipelec]]


=RTP2 Jipelec - Rapid Thermal Processor=
=RTP2 Jipelec - Rapid Thermal Processor=
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|style="background:LightGrey; color:black"|
* '''Max. 100 <sup>o</sup>C/s''' with '''carrier wafer''' or '''sample wafer'''
* '''Max. 100 <sup>o</sup>C/s''' with '''carrier wafer''' or '''sample wafer'''
* '''Max. 50 <sup>o</sup>C/s''' with SiC-coated graphite '''susceptor'''
* '''Max. 20 <sup>o</sup>C/s''' with SiC-coated graphite '''susceptor'''
|style="background:WhiteSmoke; color:black;" align="left"| At faster heating rates, the actual temperature might overshoot from the temperature setpoint in the recipe, and the susceptors/carriers might break.
|style="background:WhiteSmoke; color:black;" align="left"| At faster heating rates, the actual temperature might overshoot from the temperature setpoint in the recipe, and the susceptors/carriers might break.
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