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{{cc-nanolab}}
{{cc-nanolab}}


'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:taran@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category:Equipment|Lithography exposure]]
[[Category:Equipment|Lithography exposure]]
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=Mask Aligner vs Maskless Aligner=
=Mask Aligner vs Maskless Aligner=


Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]
In the first half of 2026, a rather thorough investigation of the differences between exposure using mask aligner and maskless aligner was conducted. The result was presented as an advanced lithography tutorial at the 2026 Nordic Nanolab User Meeting in Uppsala, Sweden.
 
Slides presented at NNUM in Uppsala: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]


Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]
<br clear="all" />
=Tools used in the investigation=
*Wafers
**100mm Si, SSP <100>
*Resist
**[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] (image reversal, but processed positive)
**[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] (positive)
**[[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] (negative)
*Spin coating (incl. HMDS)
**[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]]
*Exposure
**[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-2|Aligner: MA6-2]]
**[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-1|Aligner: MA6-1]] (in PolyFabLab)
**[[Specific Process Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]
**[[Specific Process Knowledge/Lithography/UVExposure#Aligner: Maskless 01|Aligner: Maskless 01]]
*Development (incl. PEB, if relevant)
**[[Specific_Process_Knowledge/Lithography/Development/UV_developer|Developer: TMAH UV-lithography]]
*Inspection
**[[Specific_Process_Knowledge/Characterization/Optical_microscope|Microscope Olympus MX63]]
**[[Specific_Process_Knowledge/Characterization/SEM_Supra_1|SEM Supra 1]]
**[[Specific_Process_Knowledge/Characterization/SEM_Supra_3|SEM Supra 3]]
<br clear="all" />


=Data from the investigation=
=Data from the investigation=
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
<!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]  
 
-->
==AZ 5214E==
<br clear="all" />
==AZ 5214E==  
<br clear="all" />
===Resolution (AZ 5214E)===
===Resolution (AZ 5214E)===
<br clear="all" />
<br clear="all" />
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===Resist profile (AZ 5214E)===
===Resist profile (AZ 5214E)===
<br clear="all" />
<br clear="all" />
====Linewidth and sidewall angle vs exposure dose (AZ 5214E)====
====Linewidth and sidewall angle vs exposure dose (AZ 5214E)====
<br clear="all" />
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


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====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)====
====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)====
<br clear="all" />
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


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==AZ MiR 701==
==AZ MiR 701==
<br clear="all" />
===Resolution (AZ MiR 701)===
===Resolution (AZ MiR 701)===
* Table with optimal parameters and resolution for different aligners
<br clear="all" />
* SEM pictures
'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
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==AZ nLOF 2020==
==AZ nLOF 2020==
<br clear="all" />
===Resolution (AZ nLOF 2020)===
===Resolution (AZ nLOF 2020)===
<br clear="all" />
<br clear="all" />
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
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154mJ/cm<sup>2</sup>, vacuum contact
154mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_03.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_04.jpg|400px]]


|-
|-
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|Aligner: Maskless 01 (MLA1)
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_04.jpg|400px]]


|-
|-
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220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]


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===Resist profile (AZ nLOF 2020)===
===Resist profile (AZ nLOF 2020)===
<br clear="all" />
<br clear="all" />
====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)====
====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)====
<br clear="all" />
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


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====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)====
====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)====
<br clear="all" />
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


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|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-4_04.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F6_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F6_03.jpg|280px]]
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