Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch) click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch) click here]''' | ||
[[Category: Equipment|Etch AOE]] | [[index.php?title=Category:Equipment|Etch AOE]] | ||
[[Category: Etch (Dry) Equipment|AOE]] | [[index.php?title=Category:Etch (Dry) Equipment|AOE]] | ||
== Etching using the dry etch technique AOE (Advanced oxide etch) == | == Etching using the dry etch technique AOE (Advanced oxide etch) == | ||
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*H<sub>2</sub>: 0-30 sccm | *H<sub>2</sub>: 0-30 sccm | ||
*He: 0-500 sccm | *He: 0-500 sccm | ||
*SF<sub>6</sub>: 0-300 sccm | *SF<sub>6</sub>: 0-300 sccm | ||
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