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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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==AZ 5214E==
==AZ 5214E==
===Resolution===
===Resolution===
 
'''Resolution at optimal processing conditions for different exposure equipment:'''
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'''SEM images of different size structures:'''
'''SEM images of different size structures:'''
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===Yield===
===Yield===
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
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===Resist profile (linewidth and sidewall angle)===
===Resist profile===
 
====Linewidth and sidewall angle vs exposure dose====


'''SEM images of 2µm triplets as a function of exposure dose:'''
'''SEM images of 2µm triplets as a function of exposure dose:'''
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'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''
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! width="510" |   
! width="510" |   


|+'''Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.'''
|+
|- border="0" align="center"
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
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|- align="center"
|- align="center"
| colspan="2" | Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
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====Linewidth and sidewall angle vs defocus parameter====


'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|2µm triplets
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]]


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Lines
|Lines
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]]


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'''Result of image analysis of SEM images of 2µm triplets:'''
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |  
! width="510" |  


|+'''Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>.'''
|+
|- border="0" align="center"
|- border="0" align="center"
|[[Image:5214E_Profile vs defoc.jpg|500px]]
|[[Image:5214E_Profile vs defoc.jpg|500px]]


|- align="center"
|- align="center"
| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.


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