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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category: Equipment|Lithography exposure]]
[[Category:Equipment|Lithography exposure]]
[[Category: Lithography|Exposure]]
[[Category:Lithography|Exposure]]


__TOC__
__TOC__
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=Mask Aligner vs Maskless Aligner=
=Mask Aligner vs Maskless Aligner=


Slides presented at NNUM in Uppsala 2026: [[media:MA6 vs MLA 2026_v09.pdf|'''MA6 vs MLA 2026_v09''']]
Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]


Mask design used in the investigation: [[media:LithoTestAlign_2025_v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Additional data=
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==AZ 5214E==
==AZ 5214E==
===Resolution===
===Resolution===
* Table with optimal parameters and resolution for different aligners
'''Resolution at optimal processing conditions for different exposure equipment:'''
* SEM pictures
{| class="wikitable"
|+
!Exposure equipment
!Dose
!Contact/Defoc
!Resolution
!Comment
|-
|Aligner: MA6-2
|100
|Vacuum
|1µm
|
|-
|Aligner: MA6-1
|100
|Vacuum
|1.25µm
|Probably over-exposed
|-
|Aligner: Maskless 02 (MLA2)
|90
|2
|1.25µm
|
|}
<br clear="all" />
 
'''SEM images from different exposure equipment:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!2µm triplets
!Lines
!Trenches
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
100mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|400px]]
|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|400px]]
|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-1
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_05.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
90mJ/cm<sup>2</sup>, defoc 2
|[[Image:W13 mla2 5214E D90 F2_05.jpg|400px]]
|[[Image:W13 mla2 5214E D90 F2_01.jpg|400px]]
|[[Image:W13 mla2 5214E D90 F2_02.jpg|400px]]
 
|}
<br clear="all" />
 
'''SEM images of different size structures:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!1µm triplets
!2µm triplets
!4µm triplets
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-1
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg|400px]]
 
|}
<br clear="all" />
<br clear="all" />


===Yield===
===Yield===
The yield is measured by inspecting all 116 lithographic resolution structures in an optical microscope and recording the smallest resolved dots and lines.
 
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
<br clear="all" />
<br clear="all" />


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<br clear="all" />
<br clear="all" />


'''Effect of exposure mode for mask aligner:'''
====Effect of exposure mode for mask aligner====
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="460" |  
! width="460" |  
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<br clear="all" />
<br clear="all" />


'''Effect of WEC pressure for mask aligner (after WEC head service):'''
====Effect of WEC pressure for mask aligner (after WEC head service)====
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="460" |  
! width="460" |  
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<br clear="all" />
<br clear="all" />


===Resist profile (sidewall angle and linewidth)===
===Resist profile===
*SEM pictures to support graphs?
 
====Linewidth and sidewall angle vs exposure dose====
 
'''SEM images of 2µm triplets as a function of exposure dose:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!85mJ/cm<sup>2</sup>
!90mJ/cm<sup>2</sup>
!95mJ/cm<sup>2</sup>
!100mJ/cm<sup>2</sup>
!105mJ/cm<sup>2</sup>
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
Vacuum contact
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
 
|}
<br clear="all" />
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!80mJ/cm<sup>2</sup>
!90mJ/cm<sup>2</sup>
!100mJ/cm<sup>2</sup>
!110mJ/cm<sup>2</sup>
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
Defoc 2
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
|[[Image:W13 mla2 5214E D100 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D110 F2_01.jpg|280px]]
 
|}
<br clear="all" />
 
'''Result of image analysis of SEM images of 2µm triplets:'''


[[Image:5214E_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" | 


[[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
|+
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|500px]]


[[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
|- align="center"
<!--
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). 
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
|}
! width="350" |
<br clear="all" />
! width="350" |  
 
====Linewidth and sidewall angle vs defocus parameter====
 
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!Defoc -8
!Defoc -1
!Defoc 2
!Defoc 5
!Defoc 12
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]]
 
|}
<br clear="all" />
 
'''Result of image analysis of SEM images of 2µm triplets:'''
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |  


|+'''Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.'''
|+
|- border="0" align="center"
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|450px]]
|[[Image:5214E_Profile vs defoc.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|450px]]


|- align="center"
|- align="center"
| Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). || Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.


|}
|}
-->
<br clear="all" />
<br clear="all" />


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