Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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===Resist profile | ===Resist profile=== | ||
====Linewidth and sidewall angle vs exposure dose==== | ====Linewidth and sidewall angle vs exposure dose==== | ||
'''SEM images of 2µm triplets as a function of exposure dose:''' | '''SEM images of 2µm triplets as a function of exposure dose:''' | ||