Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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===Resist profile | ===Resist profile=== | ||
====Linewidth and sidewall angle vs exposure dose==== | ====Linewidth and sidewall angle vs exposure dose==== | ||
'''SEM images of 2µm triplets as a function of exposure dose:''' | '''SEM images of 2µm triplets as a function of exposure dose:''' | ||
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====Linewidth and sidewall angle vs defocus parameter==== | ====Linewidth and sidewall angle vs defocus parameter==== | ||
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):''' | '''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:''' | ||
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