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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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===Resist profile (linewidth and sidewall angle)===
===Resist profile===
 
====Linewidth and sidewall angle vs exposure dose====
'''SEM images of 2µm triplets as a function of exposure dose:'''
'''SEM images of 2µm triplets as a function of exposure dose:'''
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'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''
====Linewidth and sidewall angle vs defocus parameter====
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
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|-style="background:WhiteSmoke; color:black"
|2µm triplets
|2µm triplets
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]]


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Lines
|Lines
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]]


|}
|}




'''Result of image analysis of SEM images of 2µm triplets:'''
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{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |  
! width="510" |