Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
Appearance
| (14 intermediate revisions by the same user not shown) | |||
| Line 3: | Line 3: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]''' | ||
[[Category: Equipment|Lithography exposure]] | [[Category:Equipment|Lithography exposure]] | ||
[[Category: Lithography|Exposure]] | [[Category:Lithography|Exposure]] | ||
__TOC__ | __TOC__ | ||
| Line 10: | Line 10: | ||
=Mask Aligner vs Maskless Aligner= | =Mask Aligner vs Maskless Aligner= | ||
Slides presented at NNUM in Uppsala 2026: [[ | Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']] | ||
Mask design used in the investigation: [[ | Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]] | ||
=Additional data= | =Additional data= | ||
| Line 19: | Line 19: | ||
==AZ 5214E== | ==AZ 5214E== | ||
===Resolution=== | ===Resolution=== | ||
{| class="wikitable" | |||
|+ | |||
!Exposure equipment | |||
!Dose | |||
!Contact/Defoc | |||
!Resolution | |||
!Comment | |||
|- | |||
|Aligner: MA6-2 | |||
|100 | |||
|Vacuum | |||
|1µm | |||
| | |||
|- | |||
|Aligner: MA6-1 | |||
|100 | |||
|Vacuum | |||
|1.25µm | |||
|Probably over-exposed | |||
|- | |||
|Aligner: Maskless 02 (MLA2) | |||
|90 | |||
|2 | |||
|1.25µm | |||
| | |||
|} | |||
<br clear="all" /> | <br clear="all" /> | ||
'''SEM images from different exposure equipment:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | ||
| Line 29: | Line 56: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
! | ! | ||
!2µm triplets | !2µm triplets | ||
!Lines | !Lines | ||
!Trenches | !Trenches | ||
| Line 40: | Line 65: | ||
|Aligner: MA6-2 | |Aligner: MA6-2 | ||
100mJ/cm<sup>2</sup>, vacuum contact | 100mJ/cm<sup>2</sup>, vacuum contact | ||
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|400px]] | |||
|[[Image:W14 MA62 5214E vac D100_B4T_01. | |[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|400px]] | ||
|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg|400px]] | |||
|[[Image:W14 MA62 5214E vac D100_B4T_02. | |||
|[[Image:W14 MA62 5214E vac D100_B4T_03. | |||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Aligner: MA6-1 | |Aligner: MA6-1 | ||
100mJ/cm<sup>2</sup>, vacuum contact | 100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed) | ||
(probably over-exposed) | |[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]] | ||
|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_01. | |[[Image:W32 PFL 5214 D100 vac C6B_05.jpg|400px]] | ||
|[[Image:W32 PFL 5214 D100 vac C6B_04. | |||
|[[Image:W32 PFL 5214 D100 vac C6B_05. | |||
|- | |- | ||
| Line 61: | Line 81: | ||
|Aligner: Maskless 02 (MLA2) | |Aligner: Maskless 02 (MLA2) | ||
90mJ/cm<sup>2</sup>, defoc 2 | 90mJ/cm<sup>2</sup>, defoc 2 | ||
|[[Image:W13 mla2 5214E D90 F2_05.jpg|400px]] | |||
|[[Image:W13 mla2 5214E D90 F2_05. | |[[Image:W13 mla2 5214E D90 F2_01.jpg|400px]] | ||
|[[Image:W13 mla2 5214E D90 F2_02.jpg|400px]] | |||
|[[Image:W13 mla2 5214E D90 F2_01. | |||
|[[Image:W13 mla2 5214E D90 F2_02. | |||
|} | |} | ||
'''SEM images of different size structures:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!1µm triplets | |||
!2µm triplets | |||
!4µm triplets | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: MA6-1 | |||
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed) | |||
|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg|400px]] | |||
|} | |||
<br clear="all" /> | <br clear="all" /> | ||
| Line 146: | Line 186: | ||
<br clear="all" /> | <br clear="all" /> | ||
===Resist profile | ===Resist profile=== | ||
====Linewidth and sidewall angle vs exposure dose==== | |||
'''SEM images of 2µm triplets as a function of exposure dose:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!85mJ/cm<sup>2</sup> | |||
!90mJ/cm<sup>2</sup> | |||
!95mJ/cm<sup>2</sup> | |||
!100mJ/cm<sup>2</sup> | |||
!105mJ/cm<sup>2</sup> | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: MA6-2 | |||
Vacuum contact | |||
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]] | |||
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]] | |||
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]] | |||
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]] | |||
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]] | |||
|} | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!80mJ/cm<sup>2</sup> | |||
!90mJ/cm<sup>2</sup> | |||
!100mJ/cm<sup>2</sup> | |||
!110mJ/cm<sup>2</sup> | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: Maskless 02 (MLA2) | |||
Defoc 2 | |||
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]] | |||
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]] | |||
|[[Image:W13 mla2 5214E D100 F2_01.jpg|280px]] | |||
|[[Image:W13 mla2 5214E D110 F2_01.jpg|280px]] | |||
|} | |||
'''Result of image analysis of SEM images of 2µm triplets:''' | |||
{| cellpadding="2" style="border: 2px solid darkgray;" align="left" | {| cellpadding="2" style="border: 2px solid darkgray;" align="left" | ||
| Line 162: | Line 254: | ||
<br clear="all" /> | <br clear="all" /> | ||
====Linewidth and sidewall angle vs defocus parameter==== | |||
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!Defoc -8 | |||
!Defoc -1 | |||
!Defoc 2 | |||
!Defoc 5 | |||
!Defoc 12 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|2µm triplets | |||
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Lines | |||
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]] | |||
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]] | |||
|} | |||
'''Result of image analysis of SEM images of 2µm triplets:''' | |||
{| cellpadding="2" style="border: 2px solid darkgray;" align="left" | {| cellpadding="2" style="border: 2px solid darkgray;" align="left" | ||
! width="510" | | ! width="510" | | ||
| Line 171: | Line 301: | ||
|- align="center" | |- align="center" | ||
| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle. | | Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle. | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||