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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category: Equipment|Lithography exposure]]
[[Category:Equipment|Lithography exposure]]
[[Category: Lithography|Exposure]]
[[Category:Lithography|Exposure]]


__TOC__
__TOC__
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=Mask Aligner vs Maskless Aligner=
=Mask Aligner vs Maskless Aligner=


Slides presented at NNUM in Uppsala 2026: [[media:MA6 vs MLA 2026_v09.pdf|'''MA6 vs MLA 2026_v09''']]
Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]


Mask design used in the investigation: [[media:LithoTestAlign_2025_v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Additional data=
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==AZ 5214E==
==AZ 5214E==
===Resolution===
===Resolution===
* Table with optimal parameters and resolution for different aligners
 
* SEM pictures
{| class="wikitable"
|+
!Exposure equipment
!Dose
!Contact/Defoc
!Resolution
!Comment
|-
|Aligner: MA6-2
|100
|Vacuum
|1µm
|
|-
|Aligner: MA6-1
|100
|Vacuum
|1.25µm
|Probably over-exposed
|-
|Aligner: Maskless 02 (MLA2)
|90
|2
|1.25µm
|
|}
<br clear="all" />
 
'''SEM images from different exposure equipment:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!2µm triplets
!Lines
!Trenches
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
100mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|400px]]
|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|400px]]
|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-1
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_05.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
90mJ/cm<sup>2</sup>, defoc 2
|[[Image:W13 mla2 5214E D90 F2_05.jpg|400px]]
|[[Image:W13 mla2 5214E D90 F2_01.jpg|400px]]
|[[Image:W13 mla2 5214E D90 F2_02.jpg|400px]]
 
|}
 
'''SEM images of different size structures:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!1µm triplets
!2µm triplets
!4µm triplets
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-1
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg|400px]]
 
|}
<br clear="all" />
<br clear="all" />


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<br clear="all" />
<br clear="all" />


===Resist profile (linewidth and sidewall angle)===
===Resist profile===
*SEM pictures to support graphs?
====Linewidth and sidewall angle vs exposure dose====
'''SEM images of 2µm triplets as a function of exposure dose:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!85mJ/cm<sup>2</sup>
!90mJ/cm<sup>2</sup>
!95mJ/cm<sup>2</sup>
!100mJ/cm<sup>2</sup>
!105mJ/cm<sup>2</sup>
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
Vacuum contact
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
 
|}
 
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!80mJ/cm<sup>2</sup>
!90mJ/cm<sup>2</sup>
!100mJ/cm<sup>2</sup>
!110mJ/cm<sup>2</sup>
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
Defoc 2
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
|[[Image:W13 mla2 5214E D100 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D110 F2_01.jpg|280px]]
 
|}
 
 
'''Result of image analysis of SEM images of 2µm triplets:'''


{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
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<br clear="all" />
<br clear="all" />


====Linewidth and sidewall angle vs defocus parameter====
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc -8
!Defoc -1
!Defoc 2
!Defoc 5
!Defoc 12
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]]
|}
'''Result of image analysis of SEM images of 2µm triplets:'''
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |  
! width="510" |  
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|- align="center"
|- align="center"
| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
|}
|}
<br clear="all" />
<br clear="all" />


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