Specific Process Knowledge/Lithography/nLOF: Difference between revisions

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-{{:Specific Process Knowledge/Lithography/authors_generic}}
+{{cc-nanolab}}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/nLOF click here]'''
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 *PEB temperature: 110°C
 *PEB time: 60 s
 The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness.
 ===PEB baking time investigation===
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 ===Solvent development===
-Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A small test of this was carried out by Thomas Anhøj @ DTU Nanolab, showing that nLOF 2020 could potentially be used for water-free lithography.
+Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A quick test of this was carried out by Thomas Anhøj @ DTU Nanolab, showing that nLOF 2020 could potentially be used for water-free lithography.
-A small report on the tests can be found here:
+A small report on the test can be found here: [[media:nLOF_solventdev_2024.pdf|'''nLOF solvent development 2024''']].