Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing click here]''' | ||
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|7/1 2025 | |7/1 2025 | ||
|taran | |taran | ||
|Old sequence (proximity bake by mistake). | |Old sequence (proximity bake and only 60s by mistake). | ||
4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | 4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | ||
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