Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing click here]''' | ||
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Test results: | Test results: | ||
{|border="1" cellspacing=" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
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|taran | |taran | ||
|4" wafer, no HMDS. 9 points on one wafer, exclusion zone 5mm | |4" wafer, no HMDS. 9 points on one wafer, exclusion zone 5mm | ||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Silicon with native oxide | |||
|4.24 µm | |||
|0.5% | |||
|7/1 2025 | |||
|taran | |||
|Old sequence (proximity bake and only 60s by mistake). | |||
4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Silicon with native oxide | |||
|3.99 µm | |||
|0.3% | |||
|7/1 2025 | |||
|taran | |||
|New sequence with contact bake. | |||
4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | |||
|} | |} | ||
==AZ nLOF 2020 coating== | ==AZ nLOF 2020 coating== | ||