Specific Process Knowledge/Characterization/XRD/Process Info: Difference between revisions
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==XRR== | ==XRR== | ||
With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and surface and interface roughness of thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials. | |||
For film thickness measurement, films up to around 100-300 nm can be measured depending on the material (thicker layers of lighter elements, thinner layers of heavy elements like Au). You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. | |||
XRR is a special case of a Theta/2Theta measurement. You can see the optics used for the measurements and read more about the principles here: [[/The Principles of X-ray Reflectivity Analysis|The principles of X-ray reflectivity analysis (XRR)]] | |||
[[/The Principles of X-ray Reflectivity Analysis|The principles of X-ray reflectivity analysis (XRR)]] | |||
==In-Plane Measurements 2θχ or 2θχ/φ scans == | ==In-Plane Measurements 2θχ or 2θχ/φ scans == | ||