Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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=Developer: TMAH Manual 02= | =Developer: TMAH Manual 02= | ||
[[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | [[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | ||
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! scope=row style="text-align: left;" | Substrate batch size | ! scope=row style="text-align: left;" | Substrate batch size | ||
| 1 | | 1 | ||
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! scope=row style="text-align: left;" | Media flow rates | |||
| | |||
*AZ 726 MIF (TMAH): 300 ml/min | |||
*Process DI water: 400 ml/min | |||
*Backside rinse DI water: 140 ml/min | |||
*Process Nitrogen: 20 l/min | |||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||
=Process information= | =Process information= | ||
All recipes use the following structure: | All recipes use the following structure: | ||
#Pressurize the TMAH canister | #Pressurize the TMAH canister | ||
#Pre-wet substrate at high RPM | |||
#Dispense puddle while rotating substrate slowly | #Dispense puddle while rotating substrate slowly | ||
#Puddle development with agitation of substrate | #Puddle development with agitation of substrate | ||