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Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions

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Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,764 edits
 
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Line 47: Line 47:
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Deposition rate
! Deposition rate
|0.5-5 Å/s
|1-5 Å/s
|1 Å/s (can be adjusted to around 5 Å/s)
|1 Å/s (can be adjusted to around 5 Å/s)
|Depends on process parameters, 1-10 Å/s  
|Depends on process parameters, 1-10 Å/s  
Line 85: Line 85:


|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Heating
|to 250 C (in 10-pocket evaporator)
|no
|no
|to 600 C
|no
|no
|-style="background:WhiteSmoke; color:black"
!Allowed materials
!Allowed materials


Line 109: Line 119:
* All samples allowed in the SEM Supra 2 or 3
* All samples allowed in the SEM Supra 2 or 3


|-style="background:WhiteSmoke; color:black"
|-style="background:LightGrey; color:black"
! Comment
! Comment
|
|
* For thicknesses above 600 nm permission is required
* Pumpdown approx 20 min.
* Pumpdown approx 20 min.
|
|
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