Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions
No edit summary |
|||
| (4 intermediate revisions by the same user not shown) | |||
| Line 37: | Line 37: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Layer thickness | ! Layer thickness | ||
|10 Å to | |10 Å to 600 nm * | ||
|10 Å to 200 nm | |10 Å to 200 nm | ||
|10 Å to 500 nm | |10 Å to 500 nm * | ||
|10 Å to 500 nm | |10 Å to 500 nm * | ||
| very thin, few nm range | | very thin, few nm range | ||
| very thin, few nm range | | very thin, few nm range | ||
| Line 47: | Line 47: | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
! Deposition rate | ! Deposition rate | ||
| | |1-5 Å/s | ||
|1 Å/s (can be adjusted to around 5 Å/s) | |1 Å/s (can be adjusted to around 5 Å/s) | ||
|Depends on process parameters, 1-10 Å/s | |Depends on process parameters, 1-10 Å/s | ||
| Line 85: | Line 85: | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Heating | |||
|to 250 C (in 10-pocket evaporator) | |||
|no | |||
|no | |||
|to 600 C | |||
|no | |||
|no | |||
|-style="background:WhiteSmoke; color:black" | |||
!Allowed materials | !Allowed materials | ||
| Line 109: | Line 119: | ||
* All samples allowed in the SEM Supra 2 or 3 | * All samples allowed in the SEM Supra 2 or 3 | ||
|-style="background: | |-style="background:LightGrey; color:black" | ||
! Comment | ! Comment | ||
| | | | ||
* Pumpdown approx 20 min. | * Pumpdown approx 20 min. | ||
| | | | ||
| Line 131: | Line 140: | ||
''' | '''*''' ''For thicknesses above 200 nm write to metal@nanolab.dtu.dk as extra deposition costs a higher fee.'' | ||
== Resistive thermal evaporation of Au == | == Resistive thermal evaporation of Au == | ||