Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions
Appearance
No edit summary |
mNo edit summary |
||
| (One intermediate revision by the same user not shown) | |||
| Line 1: | Line 1: | ||
<p style="color:red;"> | <p style="color:red;"></p> | ||
HSQ Dose Test | |||
= HSQ Dose Test = | |||
= Resist info = | = Resist info = | ||
| Line 17: | Line 18: | ||
<br clear=all> | <br clear=all> | ||
SEM images were recorded and analyzed from the structure shown below: | SEM images were recorded and analyzed from the structure shown below: The numbers indicate the line width and pitch. | ||
[[File:design.png|frameless|left|341x341px]] | [[File:design.png|frameless|left|341x341px]] | ||
<br clear=all> | <br clear=all> | ||