Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions

Rawta (talk | contribs)
Rawta (talk | contribs)
mNo edit summary
 
(2 intermediate revisions by the same user not shown)
Line 1: Line 1:
<p style="color:red;">This page is currently under construction.</p>
<p style="color:red;"></p>
 
= HSQ Dose Test =


= Resist info =
= Resist info =
Line 11: Line 13:
** Optical and SEM images and analysis   
** Optical and SEM images and analysis   


== Results ==
= Results =
Below is overview optical images of the developed pattern:
Below is overview optical images of the developed pattern:
[[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]]
[[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]]
<br clear=all>
<br clear=all>


SEM images were recorded and analyzed from the structure shown below:
SEM images were recorded and analyzed from the structure shown below: The numbers indicate the line width and pitch.
[[File:design.png|frameless|left|341x341px]]
[[File:design.png|frameless|left|341x341px]]
<br clear=all>
<br clear=all>