Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions
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= HSQ Dose Test = | |||
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** Optical and SEM images and analysis | ** Optical and SEM images and analysis | ||
= Results = | |||
Below is overview optical images of the developed pattern: | Below is overview optical images of the developed pattern: | ||
[[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]] | [[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]] | ||
<br clear=all> | <br clear=all> | ||
SEM images were recorded and analyzed from the structure shown below: | SEM images were recorded and analyzed from the structure shown below: The numbers indicate the line width and pitch. | ||
[[File:design.png|frameless| | [[File:design.png|frameless|left|341x341px]] | ||
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The measured and designed critical dimension are plotted vs the doses below: | The measured and designed critical dimension are plotted vs the doses below: | ||
[[File:CD vs dose.png|frameless| | [[File:CD vs dose.png|frameless|548x548px|dose test optical images|left]] | ||
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The line width roughness (LWR) is plotted vs CD below: | The line width roughness (LWR) is plotted vs CD below: | ||
[[File:LWR vs CD.png|frameless| | [[File:LWR vs CD.png|frameless|558x558px|dose test optical images|left]] | ||