Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions

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-= dose test =
+<p style="color:red;"></p>
-test1 bla <br>bla
-bla
+= HSQ Dose Test =
-== test2 ==
+= Resist info =
+* we used a 10 % HSQ resist for a dose test. The resist info sheet could be found [https://www.emresist.com/web/content/16597 her].
+* spinning: in labspin 3000rpm for 40s with 2s ramp (1500 acceleration) then bake for 2 min at 165 C
+* Exposure:  At 12nA ap6 (spot size 10 nm) in JEOL 9500
+** Dose test  with structures (3x3)
+** Develop for 90s using manual TMAH developer
+** Optical and SEM images and analysis
+= Results =
+Below is overview optical images of the developed pattern:
+[[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]]
+<br clear=all>
+SEM images were recorded and analyzed from the structure shown below: The numbers indicate the line width and pitch.
+[[File:design.png|frameless|left|341x341px]]
+<br clear=all>
+The measured and designed critical dimension are plotted vs the doses below:
+[[File:CD vs dose.png|frameless|548x548px|dose test optical images|left]]
+<br clear=all>
+The line width roughness (LWR) is plotted vs CD below:
+[[File:LWR vs CD.png|frameless|558x558px|dose test optical images|left]]