Specific Process Knowledge/Lithography/Strip/plasmaAsher05: Difference between revisions
Created page with "=Plasma Asher 5= 400px|thumb|Plasma asher 5 in cleanroom E-5.|right Product name: PVA Tepla Gigabatch 380M<br> Year of purchase: 2024 The Plasma Asher 5 can be used for the following processes: *Photoresist stripping *Descumming *Surface cleaning *Removal of organic passivation layers and masks Furthermore plasma processing using CF<sub>4</sub> in plasma asher 5 can be used for: *Etching of glass and ceramic *Etching of SiO<sub>2</sub>, Si<sub>3..." |
|||
| Line 21: | Line 21: | ||
The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=531 LabManager] - '''requires login''' | The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=531 LabManager] - '''requires login''' | ||
==Process Information== | |||
Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_4|here]]. | Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_4|here]]. | ||
Latest revision as of 11:21, 12 January 2026
Plasma Asher 5
Product name: PVA Tepla Gigabatch 380M
Year of purchase: 2024
The Plasma Asher 5 can be used for the following processes:
- Photoresist stripping
- Descumming
- Surface cleaning
- Removal of organic passivation layers and masks
Furthermore plasma processing using CF4 in plasma asher 5 can be used for:
- Etching of glass and ceramic
- Etching of SiO2, Si3N4, Si
- Removal of polyimide layers
Plasma asher 5 can be used for almost every material, but if you have any doubt if your materials are compatible/allowed in plasma asher 5, feel free to ask the lithography group at Nanolab.
The user manual, risk assessment, and contact information can be found in LabManager - requires login
Process Information
Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 here.
Processes specifically only for plasma asher 5: