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{{cc-nanolab}}
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Optical_microscope click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Optical_microscope click here]'''  
''This page is written by DTU Nanolab  internal''


[[Category: Equipment|Characterization Optical mi]]
[[Category: Equipment|Characterization Optical mi]]
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!Noco IR
!Noco IR
!Leica INM 100
!Leica INM 100
!Nikon Eclipse L200 #2
!Zeiss Jenatech
!Zeiss Jenatech
!Nikon Eclipse L200 #1
!Nikon Eclipse L200 #1
!Leitz Medilux
!Nikon Eclipse L200 #2
!Nikon Eclipse L200N #3
!Nikon Eclipse L200N #3
!Nikon Eclipse L200N #4
!Nikon Eclipse L200N #4
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|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]]
|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]]
|[[image:LeicaINM100.jpg|100x100px|thumb|center]]
|[[image:LeicaINM100.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]]
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]]
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]]
|[[image:Leitz Medilux.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]]
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|346-901
|346-901
|346-901
|346-901
|cleanroom B1
|cleanroom<br>D-3?
|cleanroom A1
|cleanroom<br>D-3
|cleanroom D3
|cleanroom<br>A-1
|cleanroom D3
|cleanroom<br>D-3
|cleanroom E4
|cleanroom<br>E-5
|cleanroom E5
|cleanroom<br>F-1?
|cleanroom F1
|cleanroom<br>Cx1
|cleanroom F2
|cleanroom<br>F-3
|cleanroom F3
|-
|-


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|Wet chemistry
|Wet chemistry
|Wet chemistry
|Wet chemistry
|Thin Film
|Thin Film
|Thin Film
|Thin Film
|Lithography
|Lithography
|Lithography
|Lithography
|Thin Film
|Lithography
|Thin Film
|Lithography
|Lithography
|Lithography
|Lithography
|Lithography
|Lithography
|-
|-
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*50x
*50x
|
|
*2.5x
*5x
*5x
*10x
*10x
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*100x
*100x
|
|
*2.5x
*5x
*5x
*10x
*10x
*20x
*20x
*50x
*50x
*100x
|
|
*2.5x
*2.5x
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*50x
*50x
*100x
*100x
|
*2.5x
*5x
*10x
*20x
*50x
|
|
*2.5x
*2.5x
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|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
!Ocular
!Ocular
|10x
|10x
|10x
|10x
|10x
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|Stereoscopic microscope
|Stereoscopic microscope
|IR imaging
|IR imaging
|
|
|
|
|
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*Polarizer
*Polarizer
*Brightfield
*Brightfield
|
*Brightfield
*Darkfield
|
|
*Brightfield
*Brightfield
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|
|
*Brightfield
*Brightfield
*Darkfield
|
|
*Polarizer
*Polarizer
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|
|
*Episcopic
*Episcopic
|
*Episcopic
*Diascopic
|
|
*Episcopic
*Episcopic
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|IR camera
|IR camera
|DS-Fi2
|DS-Fi2
|None
|DS-Fi1
|DS-Fi1
|None
|DS-Fi1
|DS-Fi1
|DX40-274FW
|
|
*DS-Fi2
*DS-Fi2
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|None
|None
|None
|None
|NIS-D
|NIS-D
|NIS-D
|None
|None
|NIS-BR
|NIS-BR
|Kappa Control Center
|NIS-D
|NIS-D
|NIS-D
|NIS-D
|NIS-D
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Optical_microscope"