Specific Process Knowledge/Lithography/Coaters/labspin: Difference between revisions

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VisualWikitext

@@ Line 49: / Line 49: @@
 |-
 |-style="background:silver; color:black"
-|
+!Bowlset name
 !Component solvent
 !Cleaning solvent
@@ Line 61: / Line 61: @@
 |PGMEA/Ethyl Lactate
 |Acetone
-|AZ 5214E, AZ 4562, AZ MiR 701, AZ nLOF 2000 series,
+|
-mr-I8100R?
+AZ 5214E<br>
-|Two sets available
+AZ 4562<br>
+AZ MiR 701<br>
+AZ nLOF 2000 series<br>
+mr-I8100R<br>
+AZ 15nXT
+|Two bowlsets available
 |-
@@ Line 71: / Line 76: @@
 |Anisole
 |Remover 1165
-|AR-P 6200 series (CSAR 62), ZEP520A, mr EBL 6000, PMMA (in anisole),
+|
-UV5?, mr-T85L?, XNIL26?, mri8000?, mr-I 7010E?, mr-XNIL26_SF?, mrNIL210?
+AR-P 6200 series (CSAR 62)<br>
+ZEP520A<br>
+mr EBL 6000<br>
+PMMA (in anisole)<br>
+UV5<br>
+mr-T85L<br>
+XNIL26<br>
+mri8000<br>
+mr-I 7010E<br>
+mr-XNIL26_SF<br>
+mrNIL210
 |
 |-
@@ Line 79: / Line 94: @@
 |-style="background:WhiteSmoke; color:black"
 !HSQ/AR-N 8200
-|MIBK/PGMEA
+|MIBK/PGME/n-Butyl acetate
 |Acetone
-|HSQ (FOx series), AR-N 8200
+|
+HSQ (FOx series)<br>
+AR-N 8200<br>
+AR-N 8400
 |
 |-
@@ Line 90: / Line 108: @@
 |Propyl Acetate
 |Acetone
-|OrmoComp, OrmoStamp, OrmoPrime, OrmoClad?
+|
-Inkron?, mr-I-7030R?, mr-I 8020E?, mr-I-7010E?, mrNIL210?, mr-I 8500E?, mr-T85?, MRT HI01XP?, Protek B3?, mrUVCur21?, mr-I 8100E_XP?, mrNIL210?, MRT HI01XP?, mr-NIL 6000.3E?, mr-I 8100R_XP?
+OrmoComp<br>
+OrmoStamp<br>
+OrmoPrime<br>
+OrmoClad<br>
+Inkron<br>
+mr-I-7030R<br>
+mr-I 8020E<br>
+mr-I-7010E<br>
+mrNIL210<br>
+mr-I 8500E<br>
+mr-T85<br>
+MRT HI01XP<br>
+Protek B3<br>
+mrUVCur21<br>
+mr-I 8100E_XP<br>
+mrNIL210<br>
+MRT HI01XP<br>
+mr-NIL 6000.3E<br>
+mr-I 8100R_XP
 |
 |-
@@ Line 100: / Line 136: @@
 |Mesitylene
 |T1100
-|3022-X, 4022-X
+|
+-X<br>
+-X
 |
 |-
@@ Line 107: / Line 145: @@
 |-style="background:LightGrey; color:black"
 !Epoxy/Acrylate
-|Cyclopentanone/PGMEA
+|Cyclopentanone/PGMEA/PGME/GBL
 |Acetone
-|SU-8 2000 series, mr-DWL, LOR (1A, 3A, 5A)
+|
-mr-i 8030e?, mr-NIL200?, DELO-PRE/OM4310?, OrmoStamp?, Inkron?, mr-I 8020E?, OM4310?
+SU-8 3000 series<br>
+SU-8 series<br>
+mr-DWL<br>
+LOR (1A, 3A, 5A)<br>
+mr-i 8030e<br>
+mr-NIL200<br>
+DELO-PRE/OM4310<br>
+OrmoStamp<br>
+Inkron<br>
+mr-I 8020E<br>
+OM4310
 |
 |-
@@ Line 116: / Line 164: @@
 |-
 |-style="background:WhiteSmoke; color:black"
-!AR-P 617/AR-N 7520
+!AR-P 617/AR-N 7520 New
 |PGME/PGMEA
 |Acetone
@@ Line 146: / Line 194: @@
 === Equipment performance and process related parameters ===
-{| border="2" cellspacing="0" cellpadding="2"
+{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose
 |style="background:LightGrey; color:black"|Labspin
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
 Spin coating of resist ONLY in dedicated bowlsets
 Please do NOT use substances which is not for the dedicated bowlsets
 |-
-|style="background:LightGrey; color:black"|All purpose
+|style="background:LightGrey; color:black"|Dirty bowlset
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
-Spin coating of dirty substances in '''All purpose'''
+Spin coating of other substances in dirty bowlset
 <br>
@@ Line 164: / Line 212: @@
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
 |style="background:LightGrey; color:black"|Spin speed
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
-*Vacuum chuck: 100 - 5000 rpm <br>
+*Vacuum chuck: 100 - 8000 rpm <br>
 *Edge handling chuck: Max. 3000 rpm
 |-
 |style="background:LightGrey; color:black"|Spin acceleration
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
 *200 - 4000 rpm/s <br>
@@ Line 175: / Line 223: @@
 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
 |style="background:LightGrey; color:black" |Substrate size
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
 *Chips 5x5 mm and up
 *50 mm wafers
@@ Line 183: / Line 231: @@
 |-
 | style="background:LightGrey; color:black"|Allowed materials
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
 All cleanroom materials
@@ Line 190: / Line 238: @@
 |-
 |style="background:LightGrey; color:black"|Batch
-|style="background:WhiteSmoke; color:black" align="center"|
+|style="background:WhiteSmoke; color:black"|
 |-