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Created page with "== Manual Spin Coaters == {| cellpadding="2" style="border: 2px solid darkgray;" align="right" ! width="350" | ! width="350" | ! width="350" | |- border="0" align="center" |300px |300px |300px |- align="center" | '''Spin Coater: Labspin 02''' || '''Spin Coater: Labspin 03 + fumehood 11''' || '''Spin Coater: Manual All Purpose (Decommissioned)''' |- align="center" | Loacted in w..."
 
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== Manual Spin Coaters ==
==Spin coater: Labspin==


{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
{| cellpadding="2" style="border: 0px solid darkgray;" align="right"
! width="350" |
! width="350" |
! width="350" |  
! width="350" |  
! width="350" | 


|- border="0" align="center"
|- border="0" align="center"
|[[Image:Labspin_2.JPG|300px]]
|[[Image:Labspin_2.JPG|300px]]
|[[Image:Labspin_3_+_fumehood_11.JPG|300px]]
|[[Image:Labspin_3_+_fumehood_11.JPG|300px]]
|[[Image:IMG 1175.JPG|300px]]


|- align="center"
|- align="center"
| '''Spin Coater: Labspin 02''' ||  '''Spin Coater: Labspin 03 + fumehood 11''' || '''Spin Coater: Manual All Purpose (Decommissioned)'''
|'''Spin Coater: Labspin 02'''
|'''Spin Coater: Labspin 03 + fumehood 11'''


|- align="center"
|- align="center"
| Loacted in wetbench 08 in E-5 ||  Located in wetbench 09 in E-5|| Located in fumehood in C-1
|Loacted in wetbench 08 in E-5
|Located in wetbench 09 in E-5


|- align="center"
|- align="center"
| LabSpin 6, Süss MicroTec || LabSpin 6, Süss MicroTec || WS-650, Laurell
|LabSpin 6, Süss MicroTec
|LabSpin 6, Süss MicroTec


|- align="center"
|- align="center"
| '''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=362 LabManager]''' || '''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=387 LabManager]''' || '''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]'''
|'''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=362 LabManager]'''|
|'''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=387 LabManager]'''|


|}
|}
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===Process information===
===Process information===


Spin curves (LabSpin 6): [[media:AZ5214E_spin_curve.pdf‎|AZ 5214E‎]], [[media:Spin_curve_nLoF2020.pdf‎|AZ nLOF 2020]], [[media:Spin_curve_ZEP520A.pdf‎|ZEP 520A‎]], [[media:Spin_curve_Fox-15.pdf|FOX-15]], [[media:AZ_4562_spin_curve.pdf|AZ 4562‎]], [[Specific_Process_Knowledge/Lithography/CSAR#Spin_Curves|CSAR 6200]], [[media:AZ MiR 701 spin curve.pdf|AZ MiR 701]].  
Spin curves (LabSpin 6):
*[[media:AZ5214E_spin_curve.pdf‎|AZ 5214E‎]]
*[[media:Spin_curve_nLoF2020.pdf‎|AZ nLOF 2020]]
*[[media:Spin_curve_ZEP520A.pdf‎|ZEP 520A‎]]
*[[media:Spin_curve_Fox-15.pdf|FOX-15]]
*[[media:AZ_4562_spin_curve.pdf|AZ 4562‎]]
*[[Specific_Process_Knowledge/Lithography/CSAR#Spin_Curves|CSAR 6200]]
*[[media:AZ MiR 701 spin curve.pdf|AZ MiR 701]].  


More information on resists (incl. spin curves) is available in the [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|Resist Overview]].
More information on resists (incl. spin curves) is available in the [[Specific_Process_Knowledge/Lithography/Resist|resist overview]].
 
 
'''This table is under construction''' [[Image:section under construction.jpg|70px]]


'''Available bowlsets:'''
'''Available bowlsets:'''
{|border="1" cellspacing="1" cellpadding="7" style="text-align:center;"  
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"  
|-
|-


|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
|
!Bowlset name
!Component solvent
!Component solvent
!Cleaning solvent
!Cleaning solvent
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|PGMEA/Ethyl Lactate
|PGMEA/Ethyl Lactate
|Acetone
|Acetone
|AZ 5214E, AZ 4562, AZ MiR 701, AZ nLOF 2000 series,
|
mr-I8100R?
AZ 5214E<br>
|Two sets available
AZ 4562<br>
AZ MiR 701<br>
AZ nLOF 2000 series<br>
mr-I8100R<br>
AZ 15nXT
|Two bowlsets available
|-
|-


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|Anisole
|Anisole
|Remover 1165
|Remover 1165
|AR-P 6200 series (CSAR 62), ZEP520A, mr EBL 6000, PMMA (in anisole),
|
UV5?, mr-T85L?, XNIL26?, mri8000?, mr-I 7010E?, mr-XNIL26_SF?, mrNIL210?
AR-P 6200 series (CSAR 62)<br>
ZEP520A<br>
mr EBL 6000<br>
PMMA (in anisole)<br>
UV5<br>
mr-T85L<br>
XNIL26<br>
mri8000<br>
mr-I 7010E<br>
mr-XNIL26_SF<br>
mrNIL210
|
|
|-
|-
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!HSQ/AR-N 8200
!HSQ/AR-N 8200
|MIBK/PGMEA
|MIBK/PGME/n-Butyl acetate
|Acetone
|Acetone
|HSQ (FOx series), AR-N 8200
|
HSQ (FOx series)<br>
AR-N 8200<br>
AR-N 8400
|
|
|-
|-
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|Propyl Acetate
|Propyl Acetate
|Acetone
|Acetone
|OrmoComp, OrmoStamp, OrmoPrime, OrmoClad?
|
Inkron?, mr-I-7030R?, mr-I 8020E?, mr-I-7010E?, mrNIL210?, mr-I 8500E?, mr-T85?, MRT HI01XP?, Protek B3?, mrUVCur21?, mr-I 8100E_XP?, mrNIL210?, MRT HI01XP?, mr-NIL 6000.3E?, mr-I 8100R_XP?
OrmoComp<br>
OrmoStamp<br>
OrmoPrime<br>
OrmoClad<br>
Inkron<br>
mr-I-7030R<br>
mr-I 8020E<br>
mr-I-7010E<br>
mrNIL210<br>
mr-I 8500E<br>
mr-T85<br>
MRT HI01XP<br>
Protek B3<br>
mrUVCur21<br>
mr-I 8100E_XP<br>
mrNIL210<br>
MRT HI01XP<br>
mr-NIL 6000.3E<br>
mr-I 8100R_XP
|
|
|-
|-
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|Mesitylene
|Mesitylene
|T1100
|T1100
|3022-X, 4022-X
|
3022-X<br>
4022-X
|
|
|-
|-
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Epoxy/Acrylate
!Epoxy/Acrylate
|Cyclopentanone/PGMEA
|Cyclopentanone/PGMEA/PGME/GBL
|Acetone
|Acetone
|SU-8 2000 series, mr-DWL, LOR (1A, 3A, 5A)
|
mr-i 8030e?, mr-NIL200?, DELO-PRE/OM4310?, OrmoStamp?, Inkron?, mr-I 8020E?, OM4310?
SU-8 3000 series<br>
SU-8 series<br>
mr-DWL<br>
LOR (1A, 3A, 5A)<br>
mr-i 8030e<br>
mr-NIL200<br>
DELO-PRE/OM4310<br>
OrmoStamp<br>
Inkron<br>
mr-I 8020E<br>
OM4310
|
|
|-
|-
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AR-P 617/AR-N 7520
!AR-P 617/AR-N 7520 New
|PGME/PGMEA
|PGME/PGMEA
|Acetone
|Acetone
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=== Equipment performance and process related parameters ===
=== Equipment performance and process related parameters ===


{| border="2" cellspacing="0" cellpadding="2"  
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"  


|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose
|style="background:LightGrey; color:black"|Labspin
|style="background:LightGrey; color:black"|Labspin
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Spin coating of resist ONLY in dedicated bowlsets
Spin coating of resist ONLY in dedicated bowlsets


Please do NOT use substances which is not for the dedicated bowlsets  
Please do NOT use substances which is not for the dedicated bowlsets  
|-
|-
|style="background:LightGrey; color:black"|All purpose
|style="background:LightGrey; color:black"|Dirty bowlset
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Spin coating of dirty substances in '''All purpose'''
Spin coating of other substances in dirty bowlset
<br>
<br>


Line 160: Line 212:
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
|style="background:LightGrey; color:black"|Spin speed
|style="background:LightGrey; color:black"|Spin speed
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
*Vacuum chuck: 100 - 5000 rpm <br>
*Vacuum chuck: 100 - 8000 rpm <br>
*Edge handling chuck: Max. 3000 rpm
*Edge handling chuck: Max. 3000 rpm
|-
|-
|style="background:LightGrey; color:black"|Spin acceleration
|style="background:LightGrey; color:black"|Spin acceleration
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
*200 - 4000 rpm/s <br>
*200 - 4000 rpm/s <br>


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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black" |Substrate size
|style="background:LightGrey; color:black" |Substrate size
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
*Chips 5x5 mm and up
*Chips 5x5 mm and up
*50 mm wafers
*50 mm wafers
Line 179: Line 231:
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
All cleanroom materials
All cleanroom materials


Line 186: Line 238:
|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
1  
1  
|-  
|-  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters/labspin"