Specific Process Knowledge/Etch/Wet Chromium Etch: Difference between revisions
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'''Feedback to this page''': '''[mailto:wetchemistry@ | '''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Chrominum_Etch click here]''' | ||
[[Category: Equipment|Etch Wet Chromium]] | '''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.''' | ||
[[Category: Etch (Wet) bath|Chromium]] | |||
'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.''' | |||
'''All measurements on this page has been made by Nanolab staff.''' | |||
[[index.php?title=Category:Equipment|Etch Wet Chromium]] | |||
[[index.php?title=Category:Etch (Wet) bath|Chromium]] | |||
==Wet etching of Chromium== | ==Wet etching of Chromium== | ||
[[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | [[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | ||
Wet etching of chromium at | Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here]. | ||
We use the following solution to etch chromium: | We use the following solution to etch chromium: | ||
# Commercial chromium etch (Chrome Etch 18). You can see the KBA [ | # Commercial chromium etch (Chrome Etch 18). You can see the KBA (needs login) [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K here] | ||
The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min. | |||
PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured) | |||
Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked X waste. | |||
===Overview of the chromium etch process=== | ===Overview of the chromium etch process=== | ||