Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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| TI spray resist is an image reversal resist, similar to AZ 5214E. The process flow will be similar to the process flows for 5214, except for the coating step. The exposure dose and development will depend on the specific process. | | TI spray resist is an image reversal resist, similar to AZ 5214E. The process flow will be similar to the process flows for 5214, except for the coating step. The exposure dose and development will depend on the specific process. | ||
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==Process flow examples== | |||
Comparison of specifications and feature space of the standard UV photoresists available at DTU Nanolab. These are just examples and may contain obsolete information regarding exposure dose, etc. | |||
{| class="wikitable" | |||
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! scope=row| Resist | |||
! style="width: 15%;"| AZ 5214E | |||
! style="width: 15%;"| AZ MIR 701 | |||
! style="width: 15%;"| AZ nLOF 2020 | |||
! style="width: 15%;"| AZ 4562 | |||
! style="width: 15%;"| SU-8 | |||
! style="width: 15%;"| Ti Spray | |||
|- | |||
! scope=row| Maskless aligner | |||
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* [[media:process_flow_AZ_5214E_positive_MLA_-_2023-02.docx |Process flow AZ 5214E positive MLA]] | |||
* [[media:process_flow_AZ_5214E_IR_MLA_-_2023-02.docx |Process flow AZ 5214E image reversal MLA]] | |||
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[[media:process_flow_AZ_MiR_701_MLA_-_2023-02.docx|Process flow AZ MiR 701 MLA]] | |||
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[[media:process_flow_AZ_nLOF_2020_MLA_-_2023-02.docx|Process flow AZ nLOF 2020 MLA]] | |||
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[[media:process_flow_AZ_4562_MLA_-_2023-02.docx|Process flow AZ 4562 MLA]] | |||
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[[media:process_flow_SU-8_MLA_-_2023-02.docx|Process flow SU-8 MLA]] | |||
NB! Most of the process knowledge about SU-8 is based in research groups | |||
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! scope=row| Mask aligner | |||
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* [[media:process_flow_AZ_5214E_positive_MA6_-_2023-02.docx |Process flow AZ 5214E positive MA6]] | |||
* [[media:process_flow_AZ_5214E_IR_MA6_-_2023-02.docx |Process flow AZ 5214E image reversal MA6]] | |||
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[[media:process_flow_AZ_MiR_701_MA6_-_2023-02.docx|Process flow AZ MiR 701 MA6]] | |||
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[[media:process_flow_AZ_nLOF_2020_MA6_-_2023-02.docx|Process flow AZ nLOF 2020 MA6]] | |||
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[[media:process_flow_AZ_4562_MA6_-_2023-02.docx|Process flow AZ 4562 MA6]] | |||
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[[media:process_flow_SU-8_MA6_-_2023-02.docx|Process flow SU-8 MA6]] | |||
NB! Most of the process knowledge about SU-8 is based in research groups | |||
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'''Other process flows:''' | |||
[[Media:process_flow_chip_on_carrier_-_2023-02.docx|Chip on carrier]]: A procedure for UV lithography on a chip using automatic coater and developer. | |||
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'''New resists version in 2023'''<br> | '''New resists version in 2023'''<br> | ||
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the <i>old</i> resist versions. | As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. <span style="color:red">This table contains only information about the <i>old</i> resist versions.</span> | ||
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'''New resists version in 2023'''<br> | '''New resists version in 2023'''<br> | ||
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the <i>old</i> resist versions. | As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. <span style="color:red">This table contains only information about the <i>old</i> resist versions.</span> | ||
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