Jump to content

Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

Mbec (talk | contribs)
No edit summary
Nisoer (talk | contribs)
 
(4 intermediate revisions by 2 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up click here]'''


'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
Line 21: Line 21:
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=146 Fume hood(RCA) Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=508 Fume Hood 12 (Standard clean) Info page in LabManager]




<gallery>
<gallery widths=200px heights=200px>
WaferClean.jpg|300x300px|'Wafer clean' bath in cleanroom D3
WaferClean.jpg|Wafer clean' bath in cleanroom D3
MaskClean.jpg|300x300px|'Mask clean' bath in cleanroom D3
MaskClean.jpg|Mask clean' bath in cleanroom D3
FH01-02.jpg|300x300px|Fume hood 01 and 02 in cleanroom D3
FH01-02.jpg|Fume hood 01 and 02 in cleanroom D3
Stinkskab_RR2.jpg|300x300px|Fume hood(RCA) in cleanroom B1
FH12.JPG|Fume Hood 12 (Standard clean) in cleanroom B1
</gallery>
</gallery>


Line 47: Line 47:
Cleaning of masks using the dedicated bath in Wet bench 03.
Cleaning of masks using the dedicated bath in Wet bench 03.
|
|
Cleaning of wafers using a beaker in a fumehood in cleanroom B1 or D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
Cleaning of wafers using a beaker in a fumehood in cleanroom D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"