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Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up click here]'''


'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
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*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=146 Fume hood(RCA) Info page in LabManager]
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=508 Fume Hood 12 (Standard clean) Info page in LabManager]


[[Image:WaferClean.jpg|300x300px|right|thumb|'Wafer clean' bath in cleanroom D3]]
 
[[Image:MaskClean.jpg|300x300px|right|thumb|'Mask clean' bath in cleanroom D3]]
<gallery widths=200px heights=200px>
[[Image:FH01-02.jpg|300x300px|right|thumb|Fume hood 01 and 02 in cleanroom D3]]
WaferClean.jpg|Wafer clean' bath in cleanroom D3
[[Image:Stinkskab_RR2.jpg|300x300px|right|thumb|Fume hood(RCA) in cleanroom B1]]
MaskClean.jpg|Mask clean' bath in cleanroom D3
FH01-02.jpg|Fume hood 01 and 02 in cleanroom D3
FH12.JPG|Fume Hood 12 (Standard clean) in cleanroom B1
</gallery>


===Comparing Wafer/Mask Cleaning baths and Piranha clean===
===Comparing Wafer/Mask Cleaning baths and Piranha clean===
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Cleaning of masks using the dedicated bath in Wet bench 03.
Cleaning of masks using the dedicated bath in Wet bench 03.
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Cleaning of wafers using a beaker in a fumehood in cleanroom B1 or D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
Cleaning of wafers using a beaker in a fumehood in cleanroom D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
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{{fnb|1}} In preparing a solution involving an acid, always add the acid last. The exception to this rule is Piranha, in which case you add H<sub>2</sub>O<sub>2</sub>, which is a very strong oxidant, to H<sub>2</sub>SO<sub>4</sub>, which is a very strong acid. This is done because it is potentially explosive and at the very least will cause the solution to become very warm.
{{fnb|1}} '''In preparing a solution involving an acid, always add the acid last. The exception to this rule is Piranha, in which case you add H<sub>2</sub>O<sub>2</sub>, which is a very strong oxidant, to H<sub>2</sub>SO<sub>4</sub>, which is a very strong acid. This is done because it is potentially explosive and at the very least will cause the solution to become very warm.'''