Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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[[Category: Equipment|Thin film MVD]] | '''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]''' | ||
[[Category: Thin Film Deposition|MVD]] | |||
[[index.php?title=Category:Equipment|Thin film MVD]] | |||
[[index.php?title=Category:Thin Film Deposition|MVD]] | |||
== The Molecular Vapor Deposition tool == | == The Molecular Vapor Deposition tool == | ||
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[[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom A-1]] | [[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom A-1]] | ||
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At | The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At DTU Nanolab the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps. | ||
'''As per Jan 2025 the O2 plasma is no longer possible to use, we recommend to use a plasma asher before use and then run Flat2NP and Stamp2NP respectively, where NP is for No Plasma. - rkc''' | |||
'''The user manual, user APV, and contact information can be found in LabManager:''' | '''The user manual, user APV, and contact information can be found in LabManager:''' | ||
[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=199 MVD in LabManager] | ||
==Process information== | ==Process information== | ||