Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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'''Feedback to this page''': '''[mailto:photolith@ | '''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]''' | ||
[[index.php?title=Category:Equipment|Thin film MVD]] | |||
[[index.php?title=Category:Thin Film Deposition|MVD]] | |||
== The Molecular Vapor Deposition tool == | == The Molecular Vapor Deposition tool == | ||
[[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom 1]] | [[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom A-1]] | ||
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At DTU Nanolab the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps. | |||
'''As per Jan 2025 the O2 plasma is no longer possible to use, we recommend to use a plasma asher before use and then run Flat2NP and Stamp2NP respectively, where NP is for No Plasma. - rkc''' | |||
'''The user manual, user APV, and contact information can be found in | '''The user manual, user APV, and contact information can be found in LabManager:''' | ||
===Process information | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=199 MVD in LabManager] | ||
==Process information== | |||
*[[Specific Process Knowledge/Thin film deposition/Antistiction Coating|Processing on the MVD]] | *[[Specific Process Knowledge/Thin film deposition/Antistiction Coating|Processing on the MVD]] | ||
*[[Specific Process Knowledge/Thin film deposition/Antistiction Coating#The FLAT recipe|The FLAT recipe]] | *[[Specific Process Knowledge/Thin film deposition/Antistiction Coating#The FLAT recipe|The FLAT recipe]] | ||
*[[Specific Process Knowledge/Thin film deposition/Antistiction Coating#The STAMP recipe|The STAMP recipe]] | *[[Specific Process Knowledge/Thin film deposition/Antistiction Coating#The STAMP recipe|The STAMP recipe]] | ||
== Equipment performance and process related parameters == | |||
{| border="2" cellspacing="0" cellpadding="2" | {| border="2" cellspacing="0" cellpadding="2" | ||
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|style="background:WhiteSmoke; color:black"|Chemical | |style="background:WhiteSmoke; color:black"|Chemical | ||
*Water | *Water | ||
*FDTS (new source) | *FDTS (new source, 2013) | ||
*FDTS (old source, contaminated line) | *FDTS (old source, contaminated line) | ||
*Available (line probably contaminated) | *Available (line probably contaminated, no source heater) | ||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | ||
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1" to 8" | 1" to 8" | ||
Smaller samples may be processed if fixed to carrier | Smaller samples may be processed if fixed to a carrier | ||
|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
All cleanroom materials | All cleanroom materials except steel and other ferrous materials | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||