Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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'''<p style="color:red;">The SEM LEO has been decomissioned and relocated to DTU Mechanics.</p>''' | '''<p style="color:red;">The SEM LEO has been decomissioned and relocated to DTU Mechanics in 2020.</p>''' | ||
=SEM LEO= | =SEM LEO= | ||
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The SEM LEO was a very reliable and rugged instrument that provided high quality SEM images of most samples and it served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers were acquired by the thousands on the SEM. | The SEM LEO was a very reliable and rugged instrument that provided high quality SEM images of most samples and it served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers were acquired by the thousands on the SEM. | ||
In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography. | In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography. | ||
===Typical current values for EBL=== | ===Typical current values for EBL=== | ||