Specific Process Knowledge/Lithography/Baking: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Baking click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Baking click here]''' | ||
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=Comparing baking methods= | =Comparing baking methods= | ||
{|border="1" cellspacing="1" cellpadding=" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
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![[Specific_Process_Knowledge/Lithography/Baking#Small benchtop hotplates|Spray coater hotplate]] | ![[Specific_Process_Knowledge/Lithography/Baking#Small benchtop hotplates|Spray coater hotplate]] | ||
![[Specific_Process_Knowledge/Lithography/Baking#SU-8 hotplates | ![[Specific_Process_Knowledge/Lithography/Baking#SU-8 hotplates| SU-8 hotplates<br>(1 & 2 + 3 & 4)]] | ||
![[Specific Process Knowledge/Lithography/Baking#Small_benchtop_hotplates|Small benchtop hotplates]] | ![[Specific Process Knowledge/Lithography/Baking#Small_benchtop_hotplates|Small benchtop hotplates]] | ||
![[Specific Process Knowledge/Lithography/Baking#Gamma_hotplates|Gamma hotplates]] | ![[Specific Process Knowledge/Lithography/Baking#Gamma_hotplates|Gamma hotplates]] | ||
![[Specific_Process_Knowledge/Lithography/Baking#Oven: 110C - 250C|Oven: 110C - 250C]] | ![[Specific_Process_Knowledge/Lithography/Baking#Oven: 110C - 250C|Oven: 110C - 250C]] | ||
![[Specific Process Knowledge/Lithography/ | ![[Specific Process Knowledge/Lithography/Baking#Oven_250C|Oven 250C]] | ||
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Temperature with top-plate: Actual surface temperature = 0.9 * display value | Temperature with top-plate: Actual surface temperature = 0.9 * display value | ||
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Maximum | Maximum 180°C | ||
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Hotplate: 90-110C:<br /> | Hotplate: 90-110C:<br /> | ||
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(All substrates and film or pattern of all types, unless otherwise noted on the hotplate) | (All substrates and film or pattern of all types, unless otherwise noted on the hotplate) | ||
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Silicon and glass substrates | Tool dependent. Typically Silicon, III-V, and glass substrates. | ||
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Silicon, glass, and high Tg polymer substrates | Silicon, glass, and high Tg polymer substrates | ||
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Silicon, glass, and high Tg polymer substrates | Silicon, glass, and high Tg polymer substrates | ||
Film or pattern of all types except resist | Film or pattern of all types except resist | ||
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Hotplate dependent. Any restrictions will be noted on the hotplate. | Hotplate dependent. Any restrictions will be noted on the hotplate. | ||
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Low Tg polymer, copper, steel substrates. | |||
Pb, Te films. | |||
|III-V, low Tg polymer, copper, steel substrates | |III-V, low Tg polymer, copper, steel substrates | ||
|III-V, low Tg polymer, copper, steel substrates | |III-V, low Tg polymer, copper, steel substrates | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|- valign="top" | |- valign="top" | ||
!QC | !QC<br>'''- requires login''' | ||
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https://labmanager.dtu.dk/view_binary.php?type=data&mach=293 | https://labmanager.dtu.dk/view_binary.php?type=data&mach=293 | ||
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Hotplate 2:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=124 | Hotplate 2:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=124 | ||
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<br clear="all" /> | <br clear="all" /> | ||
==SU-8 hotplates | ==SU-8 hotplates== | ||
[[Image:SU-8hotplates.jpg|300x300px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) | [[Image:SU-8hotplates.jpg|300x300px|thumb|Hotplate 1 (SU8) and Hotplate 2 (SU8) (the old set-up in C-1)]] | ||
We have | We have four hotplates dedicated to baking of SU-8. | ||
<br>Hotplate 1 (SU8) and Hotplate 2 (SU8) are located in cleanroom E-4. | |||
<br>Hotplate 3 (SU8) and Hotplate 4 (SU8) are located in PolyFabLab in building 347. | |||
Users can control the ramp-time, the baking temperature, and the baking time. | Users can control the ramp-time, the baking temperature, and the baking time. | ||
<br>The hotplates are temperature limited to 180°C. | |||
The user manual, and contact information can be found in LabManager: | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=122 Hotplate 1 (SU8)] - '''requires login''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=124 Hotplate 2 (SU8)] - '''requires login''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=454 Hotplate 4 (SU8)] - '''requires login''' | |||
<br clear="all" /> | <br clear="all" /> | ||
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'''Actual surface temperature = 0.9 * display value''' | '''Actual surface temperature = 0.9 * display value''' | ||
<div align=" | <div align="right"> | ||
<gallery widths="320px" heights="240px"> | <gallery widths="320px" heights="240px"> | ||
File:Benchtop C1.jpg|Benchtop hotplate for Spray coater located in | File:Benchtop C1.jpg|Benchtop hotplate for Spray coater located in Cx1 | ||
File:Labspin_2.JPG|Benchtop hotplates for Labspins in E-5 | File:Labspin_2.JPG|Benchtop hotplates for Labspins in E-5 | ||
</gallery> | </gallery> | ||
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'''Information about the Süss MicroTec Gamma tools can be found in labadviser:''' | '''Information about the Süss MicroTec Gamma tools can be found in labadviser:''' | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV Spin Coater: Gamma UV] | |||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV Spin Coater: Gamma e-beam & UV] | |||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography Developer TMAH UV-lithography] | |||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#S.C3.9CSS_Spinner-Stepper Spin Coater: Süss Stepper] | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#S.C3.9CSS_Spinner-Stepper Spin Coater: Süss Stepper] | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper Developer: TMAH Stepper] | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper Developer: TMAH Stepper] | ||
<br clear="all" /> | <br clear="all" /> | ||
= Ovens = | = Ovens = | ||
==Oven: 110C - 250C== | ==Oven: 110C - 250C== | ||
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The set-point can be varied, but should always be returned to 110°C after use. | The set-point can be varied, but should always be returned to 110°C after use. | ||
The user manual, and contact information can be found in LabManager: | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=119 Oven: 110C - 250C] - '''requires login''' | |||
<br clear="all" /> | <br clear="all" /> | ||
{{:Specific Process Knowledge/Lithography/Pretreatment/Oven_250C}} | |||