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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/314/Microscopy_314-307/SEM/AFEG click here]'''
''This section is written by DTU Nanolab internal if nothing else is stated.''
[[index.php?title=Category:314]]
[[index.php?title=Category:314-Microscopy]]
__FORCETOC__
=AFEG 250 Analytical ESEM (FEI Quanta FEG 250) =
=AFEG 250 Analytical ESEM (FEI Quanta FEG 250) =


[[:File:DTU Nanolab AFEG.jpeg]]
[[Image:DTU Nanolab AFEG.jpg|300x300px|right|thumb| DTU Nanolab AFEG positioned in B314 R034]]
 


The AFEG is an FEI Quanta FEG 250(Field Emission Gun) scanning electron microscope with a spatial resolution of 2 nm for the ETD detector in high vacuum at 30 keV. The microscope can operate in high vacuum and low vacuum modes at room temperature. Our AFEG is fitted with EDS and WDS detectors, which allows for analytical measurements in all the operation modes.
The AFEG is an FEI Quanta FEG 250(Field Emission Gun) scanning electron microscope with a spatial resolution of 2 nm for the ETD detector in high vacuum at 30 keV. The microscope can operate in high vacuum and low vacuum modes at room temperature. Our AFEG is fitted with EDS and WDS detectors, which allows for analytical measurements in all the operation modes.
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*'''Electron source'''
*'''Electron source'''
Field emission gun
**Field emission gun
*'''Accelerating voltage'''
*'''Accelerating voltage'''
500 V- 30 kV
**500 V- 30 kV
*'''Resolution'''
*'''Resolution'''
2 nm at 30 kV (SE)
**2 nm at 30 kV (SE)
*'''Imaging detectors'''
*'''Imaging detectors'''
Everhart-Thornley (SE/BSE), Solid State BSE, Large Field, Gaseous SE, Gaseous BSE, Gaseous Analytical, STEM, vCD and CCD Camera
**Everhart-Thornley (SE/BSE)
**Solid State BSE
**Large Field (LVD)
**Gaseous SE (GSED)
**Gaseous BSE
**Gaseous Analytical (GAD)
**STEM
**vCD
*'''Imaging modes'''
*'''Imaging modes'''
High and low vacuum
High and low vacuum
*'''Analytical capabilities'''
*'''Analytical capabilities'''
Energy dispersive X-rays (Oxford Instruments 50 mm2 X-Max silicon drift detector, MnKα resolution at 124 eV)
**Energy dispersive X-rays (Oxford Instruments 50 mm2 X-Max silicon drift detector, MnKα resolution at 124 eV)
Wavelength Dispersive Spectrosopy
**Wavelength Dispersive Spectrosopy


==Equipment performance and process related parameters==
==Equipment performance and process related parameters==
{| border="2" cellspacing="0" cellpadding="0"  
{| border="2" cellspacing="0" cellpadding="0"  
!colspan="2" border="none" style="background:silver; color:black;" align="center |Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center |Equipment  
|style="background:WhiteSmoke; color:black" align="center"|FEI QFEG 200 Cryo ESEM
|style="background:WhiteSmoke; color:black" align="center"|AFEG FEI Quanta FEG 250
|-
|-
!style="background:silver; color:black;" align="center" width="60"| Purpose  
!style="background:silver; color:black;" align="center" width="60"| Purpose  
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* 2 nm at 30 keV for Au on C sample with the ETD detector
* 2 nm at 30 keV for Au on C sample with the ETD detector
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="7"|Instrument specifics
!style="background:silver; color:black" align="center" valign="center" rowspan="6"|Instrument specifics
|style="background:LightGrey; color:black"|Detectors
|style="background:LightGrey; color:black"|Detectors
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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|style="background:LightGrey; color:black"|EDS  
|style="background:LightGrey; color:black"|EDS  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* Oxford Instruments 80 mm<sup>2</sup> X-Max silicon drift detector, MnKα resolution at 124 eV
* Oxford Instruments 50 mm<sup>2</sup> X-Max silicon drift detector, MnKα resolution at 124 eV
|-
|-
|style="background:LightGrey; color:black"|Operating pressures
|style="background:LightGrey; color:black"|Operating pressures
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* High vacuum (10<sup>-4</sup> Pa), Low vacuum (10 to 200Pa)
* High vacuum (10<sup>-4</sup> Pa), Low vacuum (10 to 200Pa)
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Samples
|style="background:LightGrey; color:black"|Sample sizes
|style="background:LightGrey; color:black"|Sample sizes
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* Conductors, Semiconductors,Insulators, Prepared Biological
* Conductors, Semiconductors,Insulators, Prepared Biological ((not pathogents!)
|-  
|-  
|}
|}
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=LabAdviser/314/SEM/QFEG click here]'''
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