Specific Process Knowledge/Etch/DRIE-Pegasus/processA/PrA-0: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/processA/PrA-0 click here]''' | |||
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! colspan="2" width="120"| Substrate Information | ! colspan="2" width="120"| Substrate Information | ||
! colspan="3" | Process Information | ! colspan="3" | Process Information | ||
! rowspan="2 | ! rowspan="2" |SEM Images | ||
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! width="30" | Wafer info | ! width="30" | Wafer info | ||
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|- | |||
| 3/6-2016 | |||
| 4" Travka20 Wafer | |||
| 20 % Si | |||
| 3 minute TDESC clean | |||
| PrA-0, 80 cycles or 14:40 minutes | |||
| C04047.04 | |||
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