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Specific Process Knowledge/Etch/DRIE-Pegasus/processA/PrA-0: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/processA/PrA-0 click here]'''


<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
<!--Checked for updates on 28/6-2023 - ok/jmli -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->
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{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
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! colspan="2" width="120"| Substrate Information
! colspan="2" width="120"| Substrate Information
! colspan="3" | Process Information
! colspan="3" | Process Information
! rowspan="2" width="500" |SEM Images
! rowspan="2" |SEM Images
|-
|-
! width="30" | Wafer info
! width="30" | Wafer info
! width="40" | Material/ Exposed area
! width="40" | Exposed area
! width="40" | Conditioning
! width="40" | Conditioning
! width="40" | Recipe
! width="40" | Recipe
! width="40" | Wafer ID
! width="40" | Wafer ID
|-
|-
| 18/8-2014
| 2/5-2016
| 4" Danchip QC Wafer  
| 4" Travka20 Wafer  
| 1.5 µm AZ resist, daq2 mask
| 20 % Si
| Si / 10 %  
| 3 minute TDESC clean
| Pegasus/jmli
| PrA-0, 80 cycles or 14:40 minutes
| 10 minute TDESC clean, 10 minute PR strip post process
| C03991.01
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
|
| S004257
[[file:C03991.01 064.jpg|150px|frameless ]]
! OLD showerhead
[[file:C03991.01 065.jpg|150px|frameless ]]
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|-
| 2/5-2016
| 4" Travka20 Wafer
| 20 % Si
| 3 minute TDESC clean
| PrA-0, 80 cycles or 14:40 minutes
| C03991.04
|
[[file:C03991.04 120.jpg|150px|frameless ]]
[[file:C03991.04 121.jpg|150px|frameless ]]
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|-
| 3/6-2016
| 4" Travka20 Wafer
| 20 % Si
| 3 minute TDESC clean
| PrA-0, 80 cycles or 14:40 minutes
| C04047.01
|
[[file:C04047.01 081.jpg|150px|frameless ]]
[[file:C04047.01 082.jpg|150px|frameless ]]
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|-
| 3/6-2016
| 4" Travka20 Wafer
| 20 % Si
| 3 minute TDESC clean
| PrA-0, 80 cycles or 14:40 minutes  
| C04047.04
|  
|  
[[file:S004257-08.jpg|150px|frameless ]]
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|-
|}
|}