Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

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+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2 click here]'''
+<!--Checked for updates on 30/7-2018 - ok/jmli -->
+<!--Checked for updates on 5/10-2020 - ok/jmli -->
+<!--Checked for updates on 28/6-2023 - ok/jmli -->
+<!--Checked for updates on 4/9-2025 - ok/jmli -->
+{{contentbydryetch}}
 == nano1.42 versus pxnano2 ==
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 |-
 |}
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 image:WF_2E09a_mar23_2011-150.jpg|'''nano1.42:''' The 150 nm trenches etched 120 seconds
 image:WF_2E09b_mar23_2011-150.jpg|'''pxnano2:''' The 150 nm trenches etched 96 seconds
 </gallery>
 {| {{table}} align="left"
+|+ nano1.42 on the Pegasus
 | align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
 | align="center" style="background:#f0f0f0;"|''''''
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 | zep||nm/min||||||||||||66||
 |-
-|
 |}
 {| {{table}} align="center"
+|+ pxnano2 on the ASE
 | align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
 | align="center" style="background:#f0f0f0;"|''''''