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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2 click here]'''
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
<!--Checked for updates on 28/6-2023 - ok/jmli -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->
{{contentbydryetch}}
== nano1.42 versus pxnano2 ==
== nano1.42 versus pxnano2 ==


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image:WF_2E09a_mar23_2011-150.jpg|'''nano1.42:''' The 150 nm trenches etched 120 seconds
image:WF_2E09a_mar23_2011-150.jpg|'''nano1.42:''' The 150 nm trenches etched 120 seconds
image:WF_2E09b_mar23_2011-150.jpg|'''pxnano2:''' The 150 nm trenches etched 96 seconds
image:WF_2E09b_mar23_2011-150.jpg|'''pxnano2:''' The 150 nm trenches etched 96 seconds
{| {{table}} align="left"
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''120'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Average'''
| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
|-
| Etch rates||nm/min||149||161||166||169||170||163||9
|-
| Sidewall angle||degs||91||91||90||90||90||90||0
|-
| CD loss||nm/edge||3||-11||-12||-34||-36||-18||17
|-
| CD loss foot||nm/edge||9||1||1||-20||-9||-4||11
|-
| Bowing||||4||4||2||6||2||4||2
|-
| Bottom curvature||||-46||-40||-37||-31||-23||-35||9
|-
| zep||nm/min||||||||||||66||
|-
|
|}
{| {{table}} align="right"
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''120'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Average'''
| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
|-
| Etch rates||nm/min||215||232||240||243||244||235||12
|-
| Sidewall angle||degs||90||89||89||89||89||89||0
|-
| CD loss||nm/edge||1||-10||-11||-33||-33||-17||15
|-
| CD loss foot||nm/edge||6||2||1||-19||-6||-3||10
|-
| Bowing||||4||2||4||3||1||3||1
|-
| Bottom curvature||||-36||-29||-22||-19||-17||-25||8
|-
| zep||nm/min||||||||||||51||
|-
|
|}


</gallery>
</gallery>


{| {{table}} align="left"
{| {{table}} align="left"
|+ nano1.42 on the Pegasus
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
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| zep||nm/min||||||||||||66||
| zep||nm/min||||||||||||66||
|-
|-
|
|}
|}
 
{| {{table}} align="center"
 
|+ pxnano2 on the ASE
{| {{table}} align="right"
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
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