Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
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== nano1.42 versus pxnano2 == | == nano1.42 versus pxnano2 == | ||
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|- | |- | ||
|} | |} | ||
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</gallery> | </gallery> | ||
{| {{table}} align="left" | {| {{table}} align="left" | ||
|+ nano1.42 on the Pegasus | |||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | ||
| align="center" style="background:#f0f0f0;"|'''''' | | align="center" style="background:#f0f0f0;"|'''''' | ||
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| zep||nm/min||||||||||||66|| | | zep||nm/min||||||||||||66|| | ||
|- | |- | ||
|} | |} | ||
{| {{table}} align="center" | |||
|+ pxnano2 on the ASE | |||
{| {{table}} align=" | |||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | ||
| align="center" style="background:#f0f0f0;"|'''''' | | align="center" style="background:#f0f0f0;"|'''''' | ||