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Specific Process Knowledge/Etch/III-V ICP/GaAs-AlGaAs: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaAs-AlGaAs click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaAs-AlGaAs click here]'''  
   
   
===GaAs/AlGaAs etching using III-V ICP===
===GaAs/AlGaAs etching using III-V ICP===
Work done by people from Photonics before 2011
'''''Recipes developed and/or tested by DTU Photonics internal before 2011'''''


{| border="1" cellspacing="2" cellpadding="3"  
{| border="1" cellspacing="2" cellpadding="3"  
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|-
|-
|Platen chiller  temperature
|Platen chiller  temperature
|20 <sup>o</sup>C
|20<sup>o</sup>C
|-
|-
|}
|}
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|-
|-
|Sidewall angle
|Sidewall angle
|~ 85-90 <sup>o</sup>
|~ 85-90<sup>o</sup>
|-
|-
|Selectivity (GaAs:Si<sub>3</sub>N<sub>4</sub>, GaAs:AlInP)  
|Selectivity (GaAs:Si<sub>3</sub>N<sub>4</sub>, GaAs:AlInP)  
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|-
|-
|Platen chiller  temperature
|Platen chiller  temperature
|20 <sup>o</sup>C
|20<sup>o</sup>C
|-
|-
|}
|}
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|-
|-
|Sidewall angle
|Sidewall angle
|~ 90 <sup>o</sup>
|~ 90<sup>o</sup>
|-
|-
|Selectivity (GaAs:SiO<sub>2</sub>)  
|Selectivity (GaAs:SiO<sub>2</sub>)  
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|-
|-
|Platen chiller  temperature
|Platen chiller  temperature
|20 <sup>o</sup>C
|20<sup>o</sup>C
|-
|-
|}
|}
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|-  
|-  
|Sidewall angle
|Sidewall angle
|85-90 <sup>o</sup>
|85-90<sup>o</sup>
|-
|-
|Selectivity (GaAs:Si<sub>3</sub>N<sub>4</sub>, GaAs:AlInP)  
|Selectivity (GaAs:Si<sub>3</sub>N<sub>4</sub>, GaAs:AlInP)  
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{| border="1" cellspacing="2" cellpadding="3"  
{| border="1" cellspacing="2" cellpadding="3"  
![[image:ICP_BCL3_result.jpg|300x300px|thumb|left|Result of GaAs etching with BCl<sub>3</sub>. Qijiang Ran, DTU Photonics, 2011. ]]
![[image:ICP_BCL3_result.jpg|300x300px|thumb|left|Result of GaAs etching with BCl<sub>3</sub>. Done by: Qijiang Ran, DTU Photonics, 2011. ]]
|-
|-
|}
|}
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